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VAC 102: Application of Residual Gas Analysis in Semiconductor Process

Course Description

This course will provide an introduction to the QMA as a residual gas analyzer. It will address the important QMA specifications and discuss how spectra are formed. Open and closed ionization sources, sampling from UHV to atmospheric pressure, and interpreting background spectra will be explained. The emphasis will be on the specific applications of the attendees, and students are encouraged to bring examples. Interpreting spectra for vacuum processes–evaporation, sputtering, chemical vapor deposition, plasma etching, and ion implantation–will be discussed as well as interpreting spectra for atmospheric pressure processes: silicon epitaxy, rapid thermal processing, and scrubber exhaust gas analysis.

Course Objectives

  • Understand the basic operation of a quadrupole mass analyzer (QMA).
  • Learn to interpret mass spectra.
  • Know the difference between background analysis and process sampling.
  • Find out what typical spectra for semiconductor processes look like.
  • Gain insight into the relationship between spectra and typical process problems.
  • Learn how to get a return on your investment by the proper use of a QMA.

Who Should Attend?

Engineers, technicians, and operators responsible for troubleshooting the semiconductor processes used for thin-film deposition, plasma etching, ion implantation, and rapid thermal processing. Also, semiconductor fab personnel who have acquired or plan to acquire a mass spectrometer residual gas analyzer and wish to get a return on their investment.

Course Length: 1 day

Course Materials: Course Notes and "Partial Pressure Analyzers and Analysis" from the AVS monograph series

Instructor: Robert Waits

email C B Yarling
Phone/Fax: 512.292.9189

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