STI | Courses | Faculty
This course will provide an introduction to the QMA as a residual gas analyzer. It will address the important QMA specifications and discuss how spectra are formed. Open and closed ionization sources, sampling from UHV to atmospheric pressure, and interpreting background spectra will be explained. The emphasis will be on the specific applications of the attendees, and students are encouraged to bring examples. Interpreting spectra for vacuum processesevaporation, sputtering, chemical vapor deposition, plasma etching, and ion implantationwill be discussed as well as interpreting spectra for atmospheric pressure processes: silicon epitaxy, rapid thermal processing, and scrubber exhaust gas analysis.
Who Should Attend?
Engineers, technicians, and operators responsible for troubleshooting the semiconductor processes used for thin-film deposition, plasma etching, ion implantation, and rapid thermal processing. Also, semiconductor fab personnel who have acquired or plan to acquire a mass spectrometer residual gas analyzer and wish to get a return on their investment.
Course Length: 1 day
Course Materials: Course Notes and "Partial Pressure Analyzers and Analysis" from the AVS monograph series
Instructor: Robert Waits