STI | Courses | Faculty
The course is designed to keep implant engineers updated with current knowledge in key important topical areas of ion implantation. Indeed, a student should be able to attend this course once per year and find an agenda with the same topics as a previous year but with totally new information that will assist them in their duties and job performance in the implant bay.
Topics for this course will be selected from the following: anneal, charging, contamination (metallic, species, energy, and particulate), metrology and process control, topics related to ion implanters (new system capabilities, upgrades, low energy performance, high energy, and machine matching), wafer characterization techniques, and SDS enhancements. The subject matter for these topics will change as knowledge and information is made available. The topics and associated module titles will be reflected in the outline for this course. Seasoned implant process engineers as well as young entry-level engineers will benefit from the information provided in this course.
Who Should Attend?
This course is specially designed for ion implant process engineers and other personnel who wish to learn about new procedures, equipment, and technology in ion implantation.
Course Length: 1 day
Course Materials: Course Notes
Instructor: Chuck Yarling
Topics Covered and Associated Module Titles