STI | Courses | Faculty
A major contributor to inefficiency and/or errors in the day-to-day operation of ion implanters is a lack of general understanding of the basic underlying concepts and cause-and-effect relationships associated with this most difficult wafer process. This course focuses on the entire implant production process, from plasma generation (source) to ion transport (scanning, vacuum) to ion measurement (dosimetry). This course introduces the common language of ion implantation as used in todays modern wafer fab. Graphics, illustrations, and quizzes are utilized to provide a stimulating and productive learning environment.
Who Should Attend?
This course is designed for operators, supervisors, new process and equipment technicians, and all other personnel who desire a common language that is useful in understanding the fundamentals of ion implantation equipment and the implant process.
Course Length: 2 days
Course Materials: Course Notes; The Implant Glossary, by C. B. Yarling, Ion Beam Press (1997)