Ion Implant Applications Manual
Second Edition, Edited by J. Zeigler
Ion Implantation Science And technology
This title is currently out of print

This is the schoolbook used for the Ion Implantation Technology School held in conjuction with the XI International Conference on Ion Implantation Technology (Austin, TX - 1996) and XII International Conference on Ion Implantation Technology (Kyoto, Japan - 1998). It contains 14 chapters written by twenty-two internationally renowned authors. Contents include:

ION IMPLANTATION APPLICATIONS: "Ion Implantation Applications in CMOS Process Technology" - R. Simonton, L. Rubin, and Y. Erokhin; "Advanced Applications of Ion Implantation for Electronic Material"s - M. I. Current, N. Cheung, P. Hemment, I. Yamada, and J. Matsuo.

ION IMPLANTATION SCIENCE: "Ion Implantation Physics" - J. F. Ziegler; "Radiation Damage and Annealing in Silicon after Ion Implantation" - J. Gyulai and K. S. Jones; "Annealing of Implantation Damage in Silicon" - K. S. Jones and J. Gyulai; "Channeling Effects in Ion Implantation into Silicon" - R. Simonton and A. Tasch.

ION IMPLANTATION TECHNOLOGY: "Modern Implanter Concepts" - H. Glawischnig, J. O'Connor, F. Sinclair, M. Harris, and M. I. Current; "Ion Source Physics" - K. Stephens; "Ion Source Operation and Maintenance" - M. Farley and R. Simonton; "Wafer Cooling and Charging in Ion Implantation" - M. Mack; "Contamination Problems in Ion Implantation" - H. Ryssel, M. I. Current, and L. Frey; "Photoresist and Particulate Problems" - T. C. Smith; "Ion Implantation Process Measurement, Characterization, and Control" - C. B. Yarling and M. I. Current; "Safety Considerations for Ion Implanters" - H. Ryssel and L. Frey.   752 pages (1996). 8.5"x11" Hard Cover.

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DescriptionISBNPrice
Ion Implant Science And Technology0-9654207-0-1$165.00

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