Ion Implant Applications Manual
Ion Implantation Science And technology

This book reveals virtually everything you need to know about four-point probe contour maps as they pertain to ion implantation and the implant process. There are over 150 contour maps of common machine and process failures made by all configurations of available medium and high-current implanters. This manual reviews implant process problems such as channeling and charging; anomalies in the starting material; as well as equipment problems with the furnace, rapid thermal annealer, and the four-point probe. 174 pages (1993). 8.5"x11" Soft Cover.

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DescriptionISBNPrice
Ion Implant Applications Manual1-889381-00-4$60.00

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